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Solution-processed lithium-doped zinc oxide thin-film transistors at low temperatures between 100 and 300 ℃

机译:在100至300℃的低温下进行固溶处理的掺杂锂的氧化锌薄膜晶体管

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摘要

Lithium-doped zinc oxide (Li-ZnO) thin-film transistors (TFTs) were fabricated by solution process at the low temperatures ranged from 100 to 300 ℃. Li-ZnO TFTs fabricated at 300 ℃ under nitrogen condition showed a mobility of 1.2 cm~2/Vs. Most importantly, the mobility of Li-ZnO TFT devices fabricated at 100 ℃ could be increased significantly from 0.08 to 0.4 cm~2/Vs by using double spin-coated and UV irradiation-treated Li-ZnO film, and the on-/off-current ratio is in the order of 10~6. Notably, the XPS analyses proved that the performance improvement was originated from the chemical composition or stoichiometry evolution, in which the hydroxide was converted into metal oxide and accelerated the formation of the oxygen vacancies. Furthermore, low-voltage operating Li-ZnO TFTs were demonstrated by using a high-capacitance ion gel gate dielectrics. The Li-ZnO TFTs with an operating voltage as low as 2 V exhibited the carrier mobilities of 2.1 and 0.65 cm~2/Vs for the devices treated at 300 and 100 ℃, respectively. The low-temperature, solution-processed Li-ZnO TFTs showed greatly potential applications in flexible displays, smart label, and sensors.
机译:在100至300℃的低温下,通过固溶工艺制备了锂掺杂氧化锌(Li-ZnO)薄膜晶体管(TFTs)。氮气条件下,在300℃下制备的Li-ZnO TFT的迁移率为1.2 cm〜2 / Vs。最重要的是,采用双旋涂和紫外线辐照处理的Li-ZnO薄膜,以及开/关,在100℃下制备的Li-ZnO TFT器件的迁移率可以从0.08显着提高到0.4 cm〜2 / Vs。 -电流比约为10〜6。值得注意的是,XPS分析证明性能的提高源自化学成分或化学计量的演变,其中氢氧化物转化为金属氧化物并加速了氧空位的形成。此外,通过使用高电容离子凝胶栅极电介质来证明了低压工作的Li-ZnO TFT。工作电压低至2 V的Li-ZnO TFT分别在300和100℃下处理的器件表现出2.1和0.65 cm〜2 / Vs的载流子迁移率。低温,固溶处理的Li-ZnO TFT在柔性显示器,智能标签和传感器中显示出巨大的潜在应用。

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  • 来源
    《Applied Physics》 |2016年第1期|311.1-311.7|共7页
  • 作者单位

    Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China,Hunan Key Laboratory for Super-microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China;

    Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China,Hunan Key Laboratory for Super-microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China;

    Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China,Hunan Key Laboratory for Super-microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China;

    Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China,Hunan Key Laboratory for Super-microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China;

    Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China,Hunan Key Laboratory for Super-microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China;

    Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China,Hunan Key Laboratory for Super-microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China,Department of Physics and Astronomy, University of Rochester, Rochester, NY 14627, USA;

    Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China,Hunan Key Laboratory for Super-microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, Hunan, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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