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首页> 外文期刊>Applied physics >Fabrication and modulation characteristics of InGaAsP/InGaAsP MQW DCPBH lasers at λ ~ 1.57 μm
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Fabrication and modulation characteristics of InGaAsP/InGaAsP MQW DCPBH lasers at λ ~ 1.57 μm

机译:λ〜1.57μm的InGaAsP / InGaAsP MQW DCPBH激光器的制备和调制特性

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摘要

InGaAsP/InGaAsP multiple-quantum-well (MQW) double-channel planar-buried heterostructure (DCPBH) lasers emitting at λ ~ 1.57 μm were fabricated by optimizing the epitaxial growth with material characterization. At 25 ℃ (85 ℃), a 1.8-μm-wide and 300-μm-long antireflectivity/high reflectivity coated laser exhibits a threshold current of 8 mA (23 mA) and a slope efficiency of 0.34 mW/mA (0.24 mW/mA) in continuous-wave mode (cw) as a result of the optimized thickness of the p-InP filling layer in the PBH structure with p-n-p-n current blocking layers. The maximum cw output power was approximately 20 MW at 25 ℃, which was reduced to 17 mW at 85 ℃. The peak wavelength varied from 1572 nm at 25 ℃ to 1602 nm at 100 ℃ for a fixed output power of 5 mW, indicating a temperature coefficient of ~ 0.4 nm/K. The resonance frequency in the small-signal modulation response of devices depends on the etching depth of the U-shaped double channel; it increases from 0.4 GHz without channel etching to 4.3 GHz with 7-μm-thick etching. The full-width at half maximum values in the horizontal and vertical far-field patterns were approximately 24.5° (25.2°) and 29.4° (30.1°), respectively, at 25 ℃ (85 ℃).
机译:通过材料表征优化外延生长,制备出了波长为λ〜1.57μm的InGaAsP / InGaAsP多量子阱(MQW)双通道平面埋藏异质结构(DCPBH)激光器。在25℃(85℃)时,宽1.8μm和长300μm的抗反射/高反射涂层激光激光器的阈值电流为8 mA(23 mA),斜率效率为0.34 mW / mA(0.24 mW /由于具有pnpn电流阻挡层的PBH结构中p-InP填充层的最优化厚度,其结果是连续波模式(cw)。在25℃时,最大连续波输出功率约为20 MW,在85℃时降至17 mW。固定输出功率为5 mW时,峰值波长从25℃的1572 nm变化到100℃的1602 nm,表明温度系数为〜0.4 nm / K。器件的小信号调制响应中的谐振频率取决于U形双通道的蚀刻深度。它从没有通道刻蚀的0.4 GHz增加到有7μm厚刻蚀的4.3 GHz。在25℃(85℃)下,水平和垂直远场图形的半峰全宽分别约为24.5°(25.2°)和29.4°(30.1°)。

著录项

  • 来源
    《Applied physics 》 |2008年第1期| 55-59| 共5页
  • 作者

    S.W. PARK; S.S. PARK; J.S. YU;

  • 作者单位

    Network Examination Team, Korean Intellectual Property Office, Daejeon 302-701, Korea Neoptek Ltd., Anyang 431-080, Korea;

    National Research Laboratory of Nonlinear Optics, Yonsei University, Seoul 120-749, Korea;

    Department of Electronic Engineering, Kyung Hee University, Yongin 446-701, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    semiconductor lasers; laser diodes; Ⅲ-Ⅴ semiconductors; Ⅲ-Ⅴ semiconductors;

    机译:半导体激光器;激光二极管Ⅲ-Ⅴ族半导体;Ⅲ-Ⅴ族半导体;

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