机译:通过无电介质方法制造的低阈值电流密度,低电阻氧化物限制的VCSEL
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Republic of Singapore;
rnSchool of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Republic of Singapore;
rnSchool of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Republic of Singapore;
rnSchool of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Republic of Singapore;
rnOptoelectronics R&D Center, Institute of Semiconductors,Chinese Academy of Sciences, P.O. Box 912, Beijing 100083,China;
rnKey Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912,Beijing 100083, China;
semiconductor lasers; laser diodes; optoelectronic device characterization, design, and modeling; quantum well devices (quantum dots, quantum wires, etc.);
机译:通过无电介质方法制造的低阈值电流密度,低电阻氧化物限制的VCSEL
机译:通过简单的自对准工艺流程制造的氧化物限制的VCSEL
机译:红色VCSEL中的低阈值电流密度
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机译:极化稳定的低阈值电流单基模VCSEL