Electrical performance of monolayer MoS2 field-effect transistors prepared by chemical vapor deposition

摘要

Molybdenum disulfide (MoS2) field effect transistors (FET) were fabricated on atomically smooth large-area single layers grown by chemical vapor deposition. The layer qualities and physical properties were characterized using high-resolution Raman and photoluminescence spectroscopy, scanning electron microscopy, and atomic force microscopy. Electronic performance of the FET devices was measured using field effect mobility measurements as a function of temperature. The back-gated devices had mobilities of 6.0?cm2/V?s at 300?K without a high-κ dielectric overcoat and increased to 16.1?cm2/V?s with a high-κ dielectric overcoat. In addition the devices show on/off ratios ranging from 105 to 109.