首页> 外文期刊>Applied Physics Letters >Influence of electron irradiation and rapid thermal annealing on photoluminescence from GaAsNBi alloys
【24h】

Influence of electron irradiation and rapid thermal annealing on photoluminescence from GaAsNBi alloys

机译:电子辐射和快速热退火对高斯内布合金的光致发光的影响

获取原文
获取原文并翻译 | 示例
       

摘要

We have examined the influence of electron irradiation and rapid thermal annealing on photoluminescence emission from GaAsNBi alloys. Electron irradiation of a 1-eV compressively strained GaNAsBi-on-GaAs epilayer, grown by molecular beam epitaxy and subsequently rapidly thermally annealed, is found to induce much stronger photoluminescence than what is observed for an identical as-grown sample upon annealing. At the same time, annealing of the irradiated sample caused a negligible spectral blueshift and reduced alloy potential energy fluctuations. These irradiation-related phenomena occurred without a change in the alloy macroscopic composition as revealed by x-ray diffraction and are mainly related to the nitrogen incorporated into non-substitutional sites in the quaternary alloy.
机译:我们研究了电子辐射和快速热退火对Gaasnbi合金的光致发光排放的影响。通过分子束外延生长的1-eV压缩紧张的GANASBI-on-GaAs脱落剂的电子照射,并随后迅速热退火,诱导比在退火时对相同的消化样品的观察到更强的光致发光。同时,辐照样品的退火导致可忽略不计的光谱蓝光和降低的合金势能波动。这些辐照相关的现象发生而没有由X射线衍射揭示的合金宏观组合物的变化,主要与季合金中的非替代位点掺入的氮气有关。

著录项

  • 来源
    《Applied Physics Letters》 |2020年第14期|142106.1-142106.4|共4页
  • 作者单位

    National Institute for Research and Development in Microtechnologies Erou lancu Nicolae 126 A 077190 Voluntari Romania Faculty of Exact Sciences and Engineering Hyperion University Calea Calarasilor 169 Bucharest Romania;

    National Institute for Research and Development in Microtechnologies Erou lancu Nicolae 126 A 077190 Voluntari Romania;

    Department of Materials Science and Engineering University of Michigan Ann Arbor Michigan 48109-2136 USA;

    National Institute for Laser Plasma and Radiation Physics 077125 Bucharest Romania;

    National Institute for Research and Development in Microtechnologies Erou lancu Nicolae 126 A 077190 Voluntari Romania;

    National Institute for Research and Development in Microtechnologies Erou lancu Nicolae 126 A 077190 Voluntari Romania;

    Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi 441-8580 Japan;

    Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi 441-8580 Japan;

    Department of Materials Science and Engineering University of Michigan Ann Arbor Michigan 48109-2136 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 22:18:03

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号