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AlScN-based MEMS magnetoelectric sensor

机译:基于ALSCN的MEMS磁电传感器

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摘要

MEMS sensors based on magnetoelectric composites have attracted great interest due to their capability to detect weak magnetic fields, showing high potential in applications like biomagnetic field detection and magnetic particle imaging. This paper reports on a scandium aluminum nitride thin film-based MEMS magnetoelectric sensor. The sensor consists of a polycrystalline silicon cantilever with a size of 1000 μm × 200 μm covered by a piezoelectric Al_(0.73)Sc_(0.27)N and a magnetostrictive (Fe_(90)Co_(10))_(78)Si_(12)B_(10) thin film. The performance of the presented sensor is investigated based on the magnetoelectric (ME) voltage coefficient, voltage noise density, and limit of detection and compared to the characteristics of the aluminum nitride thin film-based ME sensor with the same layout and fabrication technology. By using an Al_(0.73)Sc_(0.27)N thin film with a higher piezoelectric activity instead of A1N in MEMS ME sensors, the ME voltage coefficient of (1334 ± 84) V/cm Oe in resonance is almost double, thereby lowering the requirements for the electronic system. The limit of detection of (60 ± 2) pT/Hz~(0.5) remains unchanged due to the dominant thermomechanical noise in resonance.
机译:基于磁电复合材料的MEMS传感器由于其检测弱磁场的能力而引起了极大的兴趣,在生物磁场检测和磁颗粒成像等应用中显示出高潜力。本文报道了一种基于氮化铝型氮化膜的MEMS磁电传感器。该传感器由多晶硅悬臂组成的多晶硅悬臂,其尺寸为1000μm×200μm,由压电AL_(0.73)SC_(0.27)N和磁致伸缩性(FE_(90)CO_(10))_(78)SI_(12 )B_(10)薄膜。基于磁电(ME)电压系数,电压噪声密度和检测极限来研究所提出的传感器的性能,并与具有相同布局和制造技术的基于氮化铝薄膜的ME传感器的特性进行比较。通过使用具有更高压电活动的AL_(0.73)SC_(0.27)N薄膜而不是MEMS ME传感器中的A1N,谐振中的(1334±84)V / cm OE的ME电压系数几乎是双重的,从而降低了电子系统的要求。由于共振中显着的热机械噪声,检测极限(60±2)Pt / Hz〜(0.5)保持不变。

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  • 来源
    《Applied Physics Letters》 |2020年第13期|132903.1-132903.5|共5页
  • 作者单位

    Fraunhofer Institute for Silicon Technology ISIT Fraunhoferstrasse 1 25524 Itzehoe Germany;

    Fraunhofer Institute for Silicon Technology ISIT Fraunhoferstrasse 1 25524 Itzehoe Germany;

    Fraunhofer Institute for Silicon Technology ISIT Fraunhoferstrasse 1 25524 Itzehoe Germany Institute for Material Science Kiel University Kaiserstasse 2 24143 Kiel Germany;

    Institute for Material Science Kiel University Kaiserstasse 2 24143 Kiel Germany;

    Institute for Material Science Kiel University Kaiserstasse 2 24143 Kiel Germany;

    Institute for Material Science Kiel University Kaiserstasse 2 24143 Kiel Germany;

    Institute for Material Science Kiel University Kaiserstasse 2 24143 Kiel Germany;

    Fraunhofer Institute for Silicon Technology ISIT Fraunhoferstrasse 1 25524 Itzehoe Germany Institute for Material Science Kiel University Kaiserstasse 2 24143 Kiel Germany;

    Fraunhofer Institute for Silicon Technology ISIT Fraunhoferstrasse 1 25524 Itzehoe Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 22:18:02

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