首页> 外文期刊>Applied Physics Letters >Enhancement-mode CdS nanobelts field effect transistors and phototransistors with HfO_2 passivation
【24h】

Enhancement-mode CdS nanobelts field effect transistors and phototransistors with HfO_2 passivation

机译:增强模式CDS纳米纳米电场效应晶体管和光电晶体管与HFO_2钝化

获取原文
获取原文并翻译 | 示例
       

摘要

As typical direct bandgap II-VI semiconductors, quasi-one dimensional CdS nanowires, nanobelts, and nanorods have shown great potential in electronic and optoelectronic applications. However, most nano-scale CdS Field Effect Transistors (FETs) work in the depletion-mode (D-mode) due to the high unintentional n-type doping concentration, which results in high power consumption under off-state. In addition, the large dark current limits to the specific detectivity when they are fabricated into phototransistors. Here, we have synthesized single crystal CdS nanobelts (NBs) on a SiO2/Si substrate via chemical vapor deposition. The CdS NB FETs were fabricated with HfO2 as a passivation layer. It is found that the working mode of the FETs was transformed from the D-mode to the enhancement-mode with the threshold voltage changing from -22.6 to 0.7V due to the decrease in the defect density. The HfO2 passivated CdS NB phototransistor shows a responsivity of 4.7 x 10(4) A/W and an ultrahigh detectivity of 9.07 x 10(14) Jones at the source-drain voltage of 1V under an illumination wavelength of 450 nm. Our work demonstrates an effective way to achieve enhancement-mode CdS FETs and high performance phototransistors. Published under license by AIP Publishing.
机译:作为典型的直接带隙II-VI半导体,准一维CD纳米线,纳米座和纳米码在电子和光电应用中显示出很大的潜力。然而,由于高无意的n型掺杂浓度,大多数纳米尺度CDS场效应晶体管(FET)在耗尽模式(D-MODE)中工作,这导致偏离状态下的高功耗。另外,当它们被制造成光电晶体管时,大的暗电流限制为特定探测。这里,我们通过化学气相沉积在SiO 2 / Si衬底上合成单晶Cds纳米杆(NBS)。 CDS NB FET用HFO2制造为钝化层。结果发现,由于缺陷密度的降低,从D模式转换为从D形模式转换为增强模式,从-2.6到0.7V变换。 HFO2钝化的CDS Nb光电转换器显示4.7×10(4)A / W的响应度和9.07×10(14)琼松的超高探测器,在450nm的照明波长下漏极电压为1V。我们的工作展示了实现增强模式CDS FET和高性能光电扫描器的有效方法。通过AIP发布在许可证下发布。

著录项

  • 来源
    《Applied Physics Letters》 |2019年第11期|111103.1-111103.5|共5页
  • 作者单位

    Huazhong Univ Sci & Technol Wuhan Natl Lab Optoelect Wuhan 430074 Hubei Peoples R China|Chinese Acad Sci Shanghai Inst Tech Phys State Key Lab Infrared Phys Shanghai 200083 Peoples R China;

    Chinese Acad Sci Shanghai Inst Tech Phys State Key Lab Infrared Phys Shanghai 200083 Peoples R China|Univ Chinese Acad Sci Beijing 100049 Peoples R China;

    Chinese Acad Sci Shanghai Inst Tech Phys State Key Lab Infrared Phys Shanghai 200083 Peoples R China|Univ Chinese Acad Sci Beijing 100049 Peoples R China;

    Chinese Acad Sci Shanghai Inst Tech Phys State Key Lab Infrared Phys Shanghai 200083 Peoples R China|Univ Chinese Acad Sci Beijing 100049 Peoples R China;

    Wuhan Univ Sch Phys & Technol Wuhan 430072 Hubei Peoples R China;

    Chinese Acad Sci Shanghai Inst Tech Phys State Key Lab Infrared Phys Shanghai 200083 Peoples R China|Univ Chinese Acad Sci Beijing 100049 Peoples R China;

    Huazhong Univ Sci & Technol Wuhan Natl Lab Optoelect Wuhan 430074 Hubei Peoples R China;

    Huazhong Univ Sci & Technol Wuhan Natl Lab Optoelect Wuhan 430074 Hubei Peoples R China;

    Chinese Acad Sci Shanghai Inst Tech Phys State Key Lab Infrared Phys Shanghai 200083 Peoples R China|Univ Chinese Acad Sci Beijing 100049 Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 22:17:43

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号