High voltage, high current GaN-on-GaN p-n diodes with partially compensated edge termination

摘要

An approach to realizing high-voltage, high-current vertical GaN-on-GaN power diodes is reported. We show that by combining a partially compensated ion-implanted edge termination (ET) with sputtered SiNx passivation and optimized ohmic contacts, devices approaching the fundamental material limits of GaN can be achieved. Devices with breakdown voltages (V-br) of 1.68 kV and differential specific on resistances (R-on) of 0.15 m Omega cm(2), corresponding to a Baliga figure of merit of 18.8 GW/cm(2), are demonstrated experimentally. The ion-implantation-based ET has been analyzed through numerical simulation and validated by experiment. The use of a partially compensated ET layer, with approximately 40 nm of the p-type anode layer remaining uncompensated by the implant, is found to be optimal for maximizing Vbr. The implant-based ET enhances the breakdown voltage without compromising the forward characteristics. Devices exhibit near-ideal scaling with area, enabling currents as high as 12 A for a 1 mm diameter device. (C) 2018 Author(s).