首页> 外文期刊>Applied Physics Letters >Effects of Ti-W codoping on the optical and electrical switching of vanadium dioxide thin films grown by a reactive pulsed laser deposition
【24h】

Effects of Ti-W codoping on the optical and electrical switching of vanadium dioxide thin films grown by a reactive pulsed laser deposition

机译:Ti-W共掺杂对反应性脉冲激光沉积生长的二氧化钒薄膜的光学和电学转换的影响

获取原文
获取原文并翻译 | 示例
       

摘要

Thin films of thermochromic VO2, V1-xWxO2 and V1-x-yWxTiyO2 (x=0.014, and y=0.12) were synthesized onto quartz substrates using a reactive pulsed laser deposition technique. The films were then characterized by x-ray diffraction and x-ray photoelectron spectroscopy. The W and Ti dopant effects on the semiconductor-to-metal phase transition of VO2 were investigated by measuring the temperature dependence of their electrical resistivity and their infrared transmittance. Remarkably strong effects of Ti-W codoping were observed on both the optical and electrical properties of V1-x-yWxTiyO2 films. The IR transmittance was improved, while the transition temperature could be varied from 36degreesC for W-doped VO2 film to 60degreesC for Ti-W codoped VO2 film. In addition, at room temperature, a higher temperature coefficient of resistance of 5.12%/degreesC is achieved. Finally, both optical and electrical hysteresis are completely suppressed by Ti-W codoping the VO2 films. (C) 2004 American Institute of Physics.
机译:使用反应性脉冲激光沉积技术将热致变色VO2,V1-xWxO2和V1-x-yWxTiyO2薄膜(x = 0.014,y = 0.12)合成到石英基板上。然后通过X射线衍射和X射线光电子能谱表征膜。通过测量电阻率和红外透射率与温度的关系,研究了W和Ti掺杂剂对VO2半导体-金属相变的影响。观察到Ti-W共掺杂对V1-x-yWxTiyO2薄膜的光学和电学性能均具有显着影响。红外透射率得到了改善,而转变温度可以从掺W的VO2薄膜的36℃变化到掺Ti-W的VO2薄膜的60℃。另外,在室温下,获得了5.12%/℃的更高的电阻温度系数。最后,Ti-W共掺杂VO2薄膜可完全抑制光学和电滞后现象。 (C)2004美国物理研究所。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号