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首页> 外文期刊>Applied Physics Letters >GaAs/AlGaAs nanowires capped with AlGaAs layers on GaAs(311)B substrates
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GaAs/AlGaAs nanowires capped with AlGaAs layers on GaAs(311)B substrates

机译:GaAs(311)B衬底上覆盖有AlGaAs层的GaAs / AlGaAs纳米线

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摘要

We have investigated GaAs/AlGaAs nanowires capped with AlGaAs layers for optical device applications. GaAs nanowires are not so stable during AlGaAs capping growth at high temperature. However, AlGaAs nanowires retain their shapes, and GaAs nanowires sandwiched between AlGaAs wires were capped at temperatures as high as 700degreesC. The capped structures showed sharp photoluminescence peaks at around 730 nm at 4 K, which originated from excitons in quantum wires. We confirmed that the AlGaAs capping layers were grown smoothly around nanowires so that surface recombination centers in GaAs nanowires were reduced compared with air-exposed GaAs wires. (C) 2004 American Institute of Physics.
机译:我们已经研究了盖有AlGaAs层的GaAs / AlGaAs纳米线用于光学器件的应用。 GaAl纳米线在AlGaAs高温下封盖生长过程中不稳定。然而,AlGaAs纳米线保持其形状,夹在AlGaAs线之间的GaAs纳米线在高达700摄氏度的温度下封盖。封端的结构在4 K处在730 nm附近显示出尖锐的光致发光峰,其起源于量子线中的激子。我们确认,AlGaAs覆盖层在纳米线周围平滑生长,因此与空气暴露的GaAs线相比,GaAs纳米线的表面重组中心减少了。 (C)2004美国物理研究所。

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