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Optically probed wetting layer in InAs/InGaAlAs/InP quantum-dash structures

机译:InAs / InGaAlAs / InP量子点结构中的光学探测润湿层

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Photoluminescence and photoreflectance measurements have been performed to investigate molecular-beam-epitaxy-grown InAs/InGaAlAs/InP structures with different-size InAs quantum dashes. Optical features related to all relevant parts of the structure have been detected and recognized, including a line which has been attributed to the ground-state wetting layer quantum well transition. The spectral position of the latter is independent of the nominal InAs layer thickness in contrast to quantum-dash emission peak, which shifts sequentially to the red due to an increase of the islands' size. The interpretation has been supported by energy level calculations showing that the wetting layer has to be approximately 2 ML thick and that only one state is confined in such a thin well for each kind of carriers, i.e., electrons, heavy, and light holes.
机译:已经进行了光致发光和光反射测量,以研究具有不同大小的InAs量子虚线的分子束外延生长的InAs / InGaAlAs / InP结构。与结构的所有相关部分有关的光学特征已被检测和识别,包括一条归因于基态润湿层量子阱跃迁的线。与量子点发射峰相反,后者的光谱位置与标称InAs层厚度无关,而量子点发射峰由于岛的尺寸增加而依次移向红色。能级计算支持该解释,该计算表明润湿层必须约为2 ML厚,并且对于每种载流子(即电子,重空穴和轻空穴),只有一个状态被限制在如此薄的阱中。

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