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Imaging of out-of-plane interfacial strain in epitaxial PbTiO_3/SrTiO_3 thin films

机译:外延PbTiO_3 / SrTiO_3薄膜的面外界面应变成像

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In this study, we rely on low-angle annular dark-field scanning transmission electron microscopy to probe the interface strain profile in epitaxial PbTiO_3/SrTiO_3 thin-films. All samples displayed a compressively strained layer at the PbTiO_3/SrTiO_3 interface, with the strain vector parallel to the polarization direction. The width of the strained layer was found to be ~ 15-30 A, dependent on the electrode environment. Our findings open a perspective to use interface strain engineering in combination with control of electrostatic boundary conditions as a tool to monitor the effective interface polarization. These findings have implications for future use of ferroelectrics in electronic and mechanical devices.
机译:在这项研究中,我们依靠低角度环形暗场扫描透射电子显微镜来探测外延PbTiO_3 / SrTiO_3薄膜中的界面应变分布。所有样品均在PbTiO_3 / SrTiO_3界面处显示压缩应变层,应变矢量平行于偏振方向。发现应变层的宽度约为15-30 A,具体取决于电极环境。我们的发现为将界面应变工程与静电边界条件的控制结合起来用作监测有效界面极化的工具开辟了一个前景。这些发现对将来在电子和机械设备中使用铁电体有影响。

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