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Interfacial strain reliefs in epitaxial YBa_2Cu_3O_(7- delta ) thin films grown on SrTiO_3 buffered MgO substrates

机译:在SRTIO_3缓冲MgO基板上生长的外延YBA_2Cu_3O_(7-Δ)薄膜的界面应变消除

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High quality YBa_2Cu_3O_(7- delta ) (YBCO) epitaxial thin films grown on MgO substrate with a strain-relieved SrTiO_3 (STO) buffer layer have been investigated by Rutherford backscattering spectrometry (RBS), ion channeling and high resolution cross sectional transmission electron microscopy (XTEM). The in-situ growth of STO buffer layer along with the YBCO films was carried out by pulsed laser ablation. In this work, minimum yield of channeling measurements have shown that a very thin STO buffer layer is sufficient to grow highly crystalline YBCO thin films on MgO substrates. TEM studies showed that the STO layers were strain-relieved by an array of periodic edge dislocations. The YBCO films on STO buffer, as in those grown directly on an STO substrate, evolved from a strained layer to a largely dislocation free area.
机译:通过Rutherford反向散射光谱法(RBS),离子沟道和高分辨率横截截面透射电子显微镜研究,在MgO衬底上生长的高质量YBA_2CU_3O_(ybco)外延薄膜在MgO衬底上生长在MgO衬底上,离子沟道和高分辨率横截面透射电子显微镜(XTEM)。通过脉冲激光烧蚀进行STO缓冲层与YBCO膜的原位生长。在这项工作中,信道测量的最小产率表明,非常薄的STO缓冲层足以在MgO基板上生长高度结晶的YBCO薄膜。 TEM研究表明,STO层通过周期性边缘脱位阵列被应变缓解。在STO缓冲器上的YBCO薄膜,如直接生长在STO衬底上的那些,从应变层进化到大部分位错区域。

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