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首页> 外文期刊>Applied Physics Letters >Growth and photoluminescence studies of Zn-doped AlN epilayers
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Growth and photoluminescence studies of Zn-doped AlN epilayers

机译:Zn掺杂AlN外延层的生长和光致发光研究

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摘要

Deep ultraviolet time-resolved photoluminescence (PL) spectroscopy has been employed to study Zn-doped AlN epilayers grown by metal-organic chemical vapor deposition. The PL spectra of Zn-doped AlN epilayer exhibited two impurity emission lines at 5.40 and 4.50 eV, which were absent in undoped epilayers and assigned to the transitions of free electrons and electrons bound to nitrogen vacancies with three positive charges (0.90 eV deep) to the Zn~0 acceptors. By comparing PL spectra of Zn- and Mg-doped AlN epilayers with undoped epilayers, it was deduced that Zn energy level is about 0.74 eV, which is about 0.23 eV deeper than the Mg energy level (0.51 eV) in AlN. It is thus concluded that contrary to theoretical prediction, Zn would not be a better candidate than Mg as an acceptor dopant in AlN.
机译:深紫外时间分辨光致发光(PL)光谱已用于研究通过金属有机化学气相沉积法生长的Zn掺杂AlN外延层。 Zn掺杂的AlN外延层的PL光谱在5.40和4.50 eV处显示出两条杂质发射线,在未掺杂的外延层中不存在,并分配给自由电子和结合到具有三个正电荷(0.90 eV深)的氮空位的电子的跃迁Zn〜0受体。通过比较掺杂Zn和Mg的AlN外延层与未掺杂外延层的PL光谱,可以得出Zn的能级约为0.74 eV,比AlN中的Mg的能级(0.51 eV)深约0.23 eV。因此得出结论,与理论预测相反,Zn不会比Mg作为AlN中的受体掺杂剂更好。

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