Despite the necessity of direct growth of single-walled carbon nanotubes (SWNTs) on conducting films for versatility of designing device architectures for nanoelectronics and optoelectronics, most of SWNT growths have been carried out on insulating films or supporting materials such as SiO_2 and Al_2O_3. Here, the authors report that conducting ZnO films can be used as both an underlying layer for the SWNT growth and an electrode for device operation. ZnO films with a resistivity in the order of 10~(-3) Ω cm were deposited by atomic layer deposition. SWNTs were directly grown on the ZnO film by water plasma chemical vapor deposition. The authors demonstrate field emission properties from the SWNT/ZnO cathode, of which the turn-on electric field for a current density of 10 μA/cm~2 and the field enhancement factor are 1.8 V/μm and 3200, respectively.
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机译:尽管有必要在导电膜上直接生长单壁碳纳米管(SWNT)以实现纳米电子和光电子器件设计体系结构的通用性,但大多数SWNT增长都是在绝缘膜或诸如SiO_2和Al_2O_3的支撑材料上进行的。在这里,作者报告说,导电ZnO膜既可以用作SWNT生长的基础层,又可以用作器件操作的电极。通过原子层沉积法沉积电阻率为10〜(-3)Ωcm的ZnO薄膜。通过水等离子体化学气相沉积将SWNT直接生长在ZnO膜上。作者展示了SWNT / ZnO阴极的场发射特性,其中电流密度为10μA/ cm〜2时的导通电场和场增强因子分别为1.8 V /μm和3200。
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