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Structural, electrical, and optical properties of p-type ZnO thin films with Ag dopant

机译:Ag掺杂的p型ZnO薄膜的结构,电学和光学性质

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p-type ZnO films have been fabricated on a (0001) Al_2O_3 substrate, using Ag_2O as a silver dopant by pulsed laser deposition. The structural property of those films is systematically characterized by observing the shift of (0002) peak to investigate the substitution of Ag~+ for Zn~+. Narrow deposition temperature for Ag-doped p-type ZnO films has been obtained in the range of 200-250℃ with the hole concentration of 4.9 X 10~(16)-6.0 X 10~(17) cm~(-3). A neutral acceptor bound exciton has been clearly observed by photoluminescence emitted at 3.317 eV in Ag-doped p-type ZnO thin films.
机译:已经通过脉冲激光沉积使用Ag_2O作为银掺杂剂在(0001)Al_2O_3衬底上制造了p型ZnO膜。通过观察(0002)峰的位移来系统地表征这些膜的结构性能,以研究用Ag〜+代替Zn〜+。 Ag掺杂的p型ZnO薄膜的窄沉积温度在200-250℃范围内,空穴浓度为4.9 X 10〜(16)-6.0 X 10〜(17)cm〜(-3)。通过在Ag掺杂的p型ZnO薄膜中以3.317 eV发射的光致发光,可以清楚地观察到中性受体结合的激子。

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