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Doping concentration dependence of room-temperature ferromagnetism for Ni-doped ZnO thin films prepared by pulsed-laser deposition

机译:脉冲激光沉积制备Ni掺杂ZnO薄膜的室温铁磁掺杂浓度依赖性

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摘要

High-quality Ni-doped ZnO thin films of single phase with preferred c-axis growth orientation were formed on Si (100) substrates by pulsed-laser deposition at room temperature. The films exhibited room-temperature ferromagnetic behaviors with saturation magnetic moment per Ni atom of 0.37μ_B, 0.26μ_B, 0.25μ_B and 0.21μ_B for the Ni concentration of 1, 3, 5, and 7 at. %, respectively. The decrease of ferromagnetism with doping concentration demonstrates that ferromagnetism observed at room temperature is an intrinsic property of Ni-ZnO thin films, not from any secondary phase.
机译:在室温下,通过脉冲激光沉积在Si(100)衬底上形成具有优选c轴生长取向的单相高质量Ni掺杂ZnO薄膜。当Ni浓度为1,3,5和7时,薄膜表现出室温铁磁行为,每个Ni原子的饱和磁矩为0.37μB,0.26μB,0.25μB和0.21μB。 %, 分别。铁磁性随掺杂浓度的降低表明,在室温下观察到的铁磁性是Ni-ZnO薄膜的固有特性,而不是来自任何次级相。

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