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Investigation on the stabilization of the median resistance state for phase change memory cell with doublelayer chalcogenide films

机译:双层硫族化物薄膜稳定相变存储单元中值电阻状态的研究

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摘要

The triple-level data storage capability of the phase change memory with doublelayer chalcogenide films (Sb_2Te_3 and Ge_2Sb_2Te_5) was investigated. Differences in physical properties of these two chalcogenide materials contribute to the appearance of a median resistance state. However, the stable median resistance state can only be achieved by selecting appropriate programming parameters. Voltage pulses with moderate magnitude and pulse width for both set and reset operations are favorable for forming a stable median resistance stage. Interdiffusion between Sb_2Te_3 and Ge_2Sb_2Te_5 layers degrades the stabilization of the median resistance state.
机译:研究了具有双层硫族化物薄膜(Sb_2Te_3和Ge_2Sb_2Te_5)的相变存储器的三级数据存储能力。这两种硫属化物材料的物理性质差异会导致出现中值电阻状态。但是,只有选择适当的编程参数才能实现稳定的中值电阻状态。对于置位和复位操作,具有适中幅度和脉冲宽度的电压脉冲有利于形成稳定的中值电阻级。 Sb_2Te_3和Ge_2Sb_2Te_5层之间的相互扩散会降低中值电阻状态的稳定性。

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