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Effects of high carrier densities on phonon and carrier lifetimes in Si by time-resolved anti-Stokes Raman scattering

机译:时间分辨抗斯托克斯拉曼散射对高载流子密度对Si中声子和载流子寿命的影响

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The relaxation times T_1 of nonequilibrium populations of elementary excitations in Si are studied by time-resolved Raman scattering using a subpicosecond pump-probe method. Incoherent anti-Stokes Raman scattering is used to monitor the decay of the nonequilibrium populations of holes and the generation and decay of zone-center longitudinal optical (LO) phonons. At lower levels of laser excitation, hole and LO phonon T_1 lifetimes are less than 0.2 ps and greater than 1.6 ps, respectively. At higher laser intensities, the lifetime of holes increases and the lifetime of LO phonons decrease toward a common value of T_1~0.4 ps.
机译:使用亚皮秒泵浦探针方法通过时间分辨拉曼散射研究了Si中基本激发态非平衡族的弛豫时间T_1。非相干抗斯托克斯拉曼散射用于监测空穴的非平衡种群的衰减以及区域中心纵向光学(LO)声子的产生和衰减。在较低水平的激光激发下,空穴和LO声子T_1的寿命分别小于0.2 ps和大于1.6 ps。在较高的激光强度下,空穴的寿命增加,LO声子的寿命减小,向着共同的T_1〜0.4 ps值减小。

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