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首页> 外文期刊>Applied Physics Letters >Localized switching mechanism in resistive switching of atomic-iayer-deposited TiO_2 thin films
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Localized switching mechanism in resistive switching of atomic-iayer-deposited TiO_2 thin films

机译:原子层沉积TiO_2薄膜电阻转换的局部转换机制

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The resistance switching mechanism of TiO_2 films under voltage sweep mode was investigated. From the observed soft set of Pt/TiO_2/Pt sample and from the polarity-dependant switching behavior of Ir(O)/TiO_2/Pt sample, local rupture and recovery of conducting filaments near the anode interface wer identified as the switching mechanism. This is consistent with the authors' recent observation [K. Kim et al., Electrchem. Solid-State Lett. 9, G343 (2006)] of the resistance switching property of Al_2O_3/TiO_2 multilayers, where switching was controlled by the layer close to the anode. It appears that most parts of the filaments are preserved during switching and only a small portion of the film near the anode contributes to switching.
机译:研究了电压扫描模式下TiO_2薄膜的电阻转换机理。从观察到的Pt / TiO_2 / Pt样品的软定形以及Ir(O)/ TiO_2 / Pt样品的极性相关的开关行为,可以确定阳极界面附近导电丝的局部破裂和恢复是开关机理。这与作者最近的观察一致[K. Kim等,Electrchem。固态lett。 9,G343(2006)]中,Al_2O_3 / TiO_2多层膜的电阻开关性能由靠近阳极的层控制。看起来在切换期间细丝的大部分被保留,并且阳极附近的膜​​的仅一小部分有助于切换。

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