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Excimer laser irradiation induced suppression of off-state leakage current in organic transistors

机译:受激准分子激光辐照抑制有机晶体管中的关态漏电流

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The authors report the suppression of the off-state leakage current and subthreshold swing (SS) in inkjet-printed poly(3-hexylthiophene) thin-film transistors with asymmetric work function source and drain electrodes. Indium tin oxide (ITO) material was used as source/drain electrodes and the source electrode was irradiated by KrF excimer laser. The dominant mechanisms for the suppressive I_(off) could be attributed to the increase in the work function of ITO source irradiated by the excimer laser. Lower trap state density formed on the laser irradiated source electrode. Holes could be easily injected into the channel at small lateral electric field resulting in smaller threshold voltage and SS.
机译:作者报告了在具有不对称功函数源电极和漏电极的喷墨印刷聚(3-己基噻吩)薄膜晶体管中,关态漏电流和亚阈值摆幅(SS)的抑制。氧化铟锡(ITO)材料用作源/漏电极,并用KrF准分子激光照射源电极。抑制I_(off)的主要机理可以归因于受激准分子激光器辐照的ITO源的功函数的增加。在激光照射的源电极上形成较低的陷阱态密度。在较小的横向电场下,可以很容易地将空穴注入到通道中,从而产生较小的阈值电压和SS。

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