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Anomalous photoluminescence behavior from amorphous Ge quantum dots produced by buffer-layer-assisted growth

机译:缓冲层辅助生长产生的非晶Ge量子点的异常光致发光行为

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摘要

The authors present photoluminescence results from amorphous Ge quantum dots formed using buffer-layer-assisted growth. Their sizes, shapes, and densities were controlled by varying the thickness of the Xe buffer layer, with sizes varying from 2 to 8 nm. A relatively weak signal was observed at ~3 K at ~0.91 eV that was independent of size and was insensitive to laser intensity. Its temperature-dependent magnitude showed a Berthelot-type behavior that they associate with hopping of carriers between radiative tail states and shallow nonradiative states. These findings are similar to those from porous semiconductors.
机译:作者介绍了使用缓冲层辅助生长形成的非晶Ge量子点的光致发光结果。通过改变Xe缓冲层的厚度来控制它们的大小,形状和密度,大小从2到8 nm不等。在〜0.91 eV在〜3 K处观察到相对弱的信号,该信号与大小无关,并且对激光强度不敏感。其与温度有关的幅度显示了Berthelot型行为,它们与载流子在辐射尾态和浅非辐射态之间的跳跃相关。这些发现与多孔半导体的发现相似。

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