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首页> 外文期刊>Applied Physicsletters >Hole mobility in Mg-doped p-type InN films
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Hole mobility in Mg-doped p-type InN films

机译:掺镁p型InN膜中的空穴迁移率

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摘要

Mg-doped p-type InN layers with different thicknesses were grown under the same growth/doping conditions so that their net acceptor concentrations were almost the same (3-6) × 10~(18) cm~(-3), which were confirmed by electrolyte capacitance-voltage measur
机译:在相同的生长/掺杂条件下生长具有不同厚度的Mg掺杂的p型InN层,使它们的净受体浓度几乎相同(3-6)×10〜(18)cm〜(-3)。通过电解质电容-电压测量确定

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