Electrical hysteresis of the Ti_(0.25)AI_(0.75)O_X dielectric films after high-temperature treatment

Lei Shi; Yidong Xia; Kuibo Yin; Zhiguo Liu

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Electrical hysteresis of the Ti_(0.25)AI_(0.75)O_X dielectric films after high-temperature treatment

机译：高温处理后的Ti_（0.25）AI_（0.75）O_X介电膜的电滞后

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The primary goal of this work is to investigate the electrical hysteresis of dielectric pseudobinary Ti_(0.25)Al_(0.75)O_x films after high-temperature treatment. The Ti_(0.25)Al_(0.75)O_x films show electrical hysteresis in the C-V measurements after hig

机译：这项工作的主要目的是研究高温处理后电介质假二元Ti_（0.25）Al_（0.75）O_x薄膜的电滞后。 Ti_（0.25）Al_（0.75）O_x薄膜在hig后的C-V测量中显示出电滞后

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《Applied Physicsletters》 |2008年第13期|196-198|共3页
作者
Lei Shi; Yidong Xia; Kuibo Yin; Zhiguo Liu;
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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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5. An investigation of the dielectric and hysteresis properties of PLZT ferroelectric and multilayer composite thin films. [D] . Dausch, David Edward. 1995

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6. Characterization upon electrical hysteresis and thermal diffusion of TiAl3Ox dielectric film [O] . Lei Shi, Zhiguo Liu 2011

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7. Dielectric properties of columnar-grained (Ba0.75Sr0.25)(Zr0.25Ti 0.75)O3 thin films prepared by pulsed laser deposition [O] . Tang X, Wang J, Chan HLW 2005

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Electrical hysteresis of the Ti_(0.25)AI_(0.75)O_X dielectric films after high-temperature treatment

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