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Evaluation of strain balancing layer thickness for InAs/GaAs quantum dot arrays using high resolution x-ray diffraction and photoluminescence

机译:使用高分辨率x射线衍射和光致发光评估InAs / GaAs量子点阵列的应变平衡层厚度

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摘要

The impact of strain-balancing quantum dot superlattice arrays is critical to device performance. InAs/GaAs/GaP strain-balanced quantum dot arrays embedded in p-i-n diodes were investigated via high resolution x-ray diffraction (HRXRD) and photoluminescence (PL) as a function of the GaP thickness. A three-dimensional modification of the continuum elasticity theory was proposed and an optimal thickness was determined to be 3.8 ML. HRXRD-determined in-plane strain in superlattices with this range of GaP thickness gave an empirical value for the GaP thickness to be 4.5 ML. Optical characterization indicated the highest integrated PL intensity for the sample at the optimal strain balanced condition.
机译:应变平衡量子点超晶格阵列的影响对于器件性能至关重要。通过高分辨率x射线衍射(HRXRD)和光致发光(PL)对GaP厚度的函数研究了嵌入在p-i-n二极管中的InAs / GaAs / GaP应变平衡量子点阵列。提出了对连续弹性理论的三维修改,并将最佳厚度确定为3.8 ML。在此GaP厚度范围内,由HRXRD确定的超晶格面内应变得出的经验值为GaP厚度为4.5 ML。光学表征表明在最佳应变平衡条件下样品的最高积分PL强度。

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  • 来源
    《Applied Physicsletters》 |2009年第20期|203110.1-203110.3|共3页
  • 作者单位

    NanoPower Research Labs, Rochester Institute of Technology, 156 Lomb Memorial Dr., Rochester, New York 14623, USA;

    NanoPower Research Labs, Rochester Institute of Technology, 156 Lomb Memorial Dr., Rochester, New York 14623, USA;

    NanoPower Research Labs, Rochester Institute of Technology, 156 Lomb Memorial Dr., Rochester, New York 14623, USA;

    NanoPower Research Labs, Rochester Institute of Technology, 156 Lomb Memorial Dr., Rochester, New York 14623, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:20:07

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