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首页> 外文期刊>Applied Physics Letters >Enhancement of magnetoresistance by hydrogen ion treatment for current-perpendicular-to-plane giant magnetoresistive films with a current-confined-path nano-oxide layer
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Enhancement of magnetoresistance by hydrogen ion treatment for current-perpendicular-to-plane giant magnetoresistive films with a current-confined-path nano-oxide layer

机译:通过氢离子处理增强具有电流限制路径纳米氧化物层的电流垂直于平面的巨磁致电阻膜的磁阻

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摘要

We have enhanced magnetoresistance (MR) for current-perpendicular-to-plane giant-magnetoresistive (CPP-GMR) films with a current-confined-path nano-oxide layer (CCP-NOL). In order to realize higher purity in Cu for CCPs, hydrogen ion treatment (HIT) was applied as the CuO_x reduction process. By applying the HIT process, an MR ratio was increased to 27.4% even in the case of using conventional FeCo magnetic layer, from 13.0% for a reference without the HIT process. Atom probe tomography data confirmed oxygen reduction by the HIT process in the CCP-NOL. The relationship between oxygen counts and MR ratio indicates that further oxygen reduction would realize an MR ratio greater than 50%.
机译:我们通过电流限制路径纳米氧化物层(CCP-NOL)增强了电流垂直平面超大磁阻(CPP-GMR)膜的磁阻(MR)。为了实现CCP中Cu的更高纯度,采用氢离子处理(HIT)作为CuO_x还原工艺。通过应用HIT工艺,即使在使用传统的FeCo磁性层的情况下,MR比也从不使用HIT工艺的参考的13.0%增加到27.4%。原子探针层析成像数据证实了通过CCP-NOL中的HIT工艺可以减少氧气。氧含量与MR比率之间的关系表明,进一步减少氧含量将使MR比率大于50%。

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  • 来源
    《Applied Physics Letters》 |2010年第11期|p.112501.1-112501.3|共3页
  • 作者单位

    Toshiba Corporation, Corporate R & D Center, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;

    rnToshiba Corporation, Corporate R & D Center, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;

    rnToshiba Corporation, Corporate R & D Center, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;

    rnToshiba Corporation, Corporate R & D Center, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;

    rnToshiba Corporation, Corporate R & D Center, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;

    rnHeadway Technologies, 678 S. Hillview Drive, Milpitas, California 95035, USA;

    rnHeadway Technologies, 678 S. Hillview Drive, Milpitas, California 95035, USA;

    rnHeadway Technologies, 678 S. Hillview Drive, Milpitas, California 95035, USA;

    rnHeadway Technologies, 678 S. Hillview Drive, Milpitas, California 95035, USA;

    rnHeadway Technologies, 678 S. Hillview Drive, Milpitas, California 95035, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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