机译:金属/高k栅叠层结构中的光诱导电荷俘获现象的同步加速器辐射光发射光谱研究
Department of Applied Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan;
rnDepartment of Applied Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan CREST, Japan Science and Technology Agency, Chiyoda-ku, Tokyo 102-0075, Japan Synchrotron Radiation Research Organization, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan;
rnDepartment of Applied Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan;
rnDepartment of Applied Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan Synchrotron Radiation Research Organization, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan PREST, Japan Science and Technology Agency, Chiyoda-ku, Tokyo 102-0075, Japan;
rnDepartment of Applied Chemistry, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan CREST, Japan Science and Technology Agency, Chiyoda-ku, Tokyo 102-0075, Japan Synchrotron Radiation Research Organization, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan;
rnSemiconductor Technology Academic Research Center, Kohoku-ku, Kanagawa 222-0033, Japan;
rnSemiconductor Technology Academic Research Center, Kohoku-ku, Kanagawa 222-0033, Japan;
rnSemiconductor Technology Academic Research Center, Kohoku-ku, Kanagawa 222-0033, Japan;
机译:TiN / HfSiON栅堆叠结构的热稳定性用同步辐射辐射光发射光谱法研究
机译:利用同步辐射通过光发射光谱研究A-si / hfsio(n)/ si栅堆叠结构的热稳定性
机译:光发射光谱研究金属/双层高k栅堆叠结构中有效功函数的决定因素
机译:通过同步辐射照射光谱研究研究的栅电极和HFO2 / SI栅极堆之间的退火诱导的界面反应
机译:通过基于同步加速器的光发射光谱研究了氮化物半导体的表面化学和电子性质。
机译:高分辨率同步辐射辐射光电子学研究epi Ge(001)-2×1与原子和分子氧键的微观关系
机译:通过同步辐射光电子光谱研究的金属/高k栅极堆叠结构中的深度剖面分析