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Carrier recombination processes in Mg-doped N-polar InN films

机译:掺镁N极InN薄膜中的载流子复合过程

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摘要

We investigate the nonradiative carrier recombination (NR) process in Mg-doped p-InN films having lower photoluminescence (PL) intensity than n-InN films. The NR activation energy in the p-type films is found to be in a range of 9-15 meV, which is smaller than that in n-InN films (40-65 meV). We also investigate the effect of the greater mean free path of minority carriers in p-InN. At room temperature the collision rate of minority carriers with NR centers within the radiative lifetime in p-InN is found to be three orders of magnitude greater than that in n-InN.
机译:我们研究了掺镁的p-InN薄膜的非辐射载流子复合(NR)过程,该薄膜的光致发光(PL)强度低于n-InN薄膜。发现在p型膜中的NR活化能在9-15meV的范围内,该范围小于在n-InN膜(40-65meV)中的NR活化能。我们还研究了p-InN中少数载流子的更大平均自由程的影响。在室温下,p-InN辐射寿命内少数带有NR中心的载流子的碰撞率比n-InN大3个数量级。

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  • 来源
    《Applied Physics Letters》 |2011年第18期|p.181908.1-181908.3|共3页
  • 作者单位

    Graduate School of Electrical and Electronic Engineering, Venture Business Laboratory, Chiba University,1-33 Yayoicho, Inage-ku, Chiba 263-8522, Japan;

    Graduate School of Electrical and Electronic Engineering, Venture Business Laboratory, Chiba University,1-33 Yayoicho, Inage-ku, Chiba 263-8522, Japan;

    Graduate School of Electrical and Electronic Engineering, Venture Business Laboratory, Chiba University,1-33 Yayoicho, Inage-ku, Chiba 263-8522, Japan;

    Graduate School of Electrical and Electronic Engineering, Venture Business Laboratory, Chiba University,1-33 Yayoicho, Inage-ku, Chiba 263-8522, Japan;

    State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, People's Republic of China;

    Graduate School of Electrical and Electronic Engineering, Venture Business Laboratory, Chiba University,1-33 Yayoicho, Inage-ku, Chiba 263-8522, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:17:56

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