Correlation of photoconductivity response of amorphous In-Ga-Zn-O films with transistor performance using microwave photoconductivity decay method

摘要

The film quality of amorphous In-Ga-Zn-O (a-IGZO), an amorphous oxide semiconductor (AOS), was studied by the microwave photoconductivity decay (μ-PCD) method. Also, μ-PCD mappings over a 6 in. wafer were undertaken. It was found that the peak signal of the decay curve had a strong correlation with the a-IGZO transistor performance and hence the film quality. The film annealed under a wet condition showed the highest mobility and had the highest peak signal. The μ-PCD method was found to be a very useful tool to evaluate the film quality and predict the performance of AOS transistors fabricated under different process conditions.