Film thickness measuring method, the film thickness measuring apparatus and an image forming apparatus having the film thickness measuring device, and manufacturing method and the photoconductive photosensitive member of photoconductive photoconductive

摘要

PROBLEM TO BE SOLVED: To simultaneously, highly accurately, and surely measure a film thickness of a surface layer into which fine particles of filler are dispersed and a film thickness of a photosensitive layer containing a surface layer into which fine particles of filler are dispersed in a photoconductive photoreceptor.;SOLUTION: In measuring a film thickness of the photoconductive photoreceptor with an intermediate layer and a photosensitive layer in which a portion of a predetermined thickness of the photosensitive layer is formed as a surface layer, light from a light source is vertically entered into the photoconductive photoreceptor; first interference light between first reflection reflected at a surface of the surface layer and second reflection reflected at a surface of the intermediate layer and second interference light between the first reflection and third reflection reflected at a surface of the surface layer in the side of the intermediate layer among incident light are directed to a spectroscopic means and subjected to dispersion; an interference waveform is obtained by expanding a reflectance to an optional size when computing the reflectance from the dispersed spectrum intensity; and the film thickness of the surface layer is computer-calculated based on low frequency components of the interference waveform and the film thickness of the photosensitive layer is computer-calculated based on high frequency components of the interference waveform.;COPYRIGHT: (C)2011,JPO&INPIT