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The effects of La substitution on ferroelectric domain structure and multiferroic properties of epitaxially grown BiFeO_3 thin films

机译:La取代对外延生长BiFeO_3薄膜铁电畴结构和多铁性的影响

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摘要

We report the influence of La substitution in epitaxial BiFeO_3 thin films prepared by pulsed layer deposition on a Nb-doped SrTiO_3 substrate, focusing on ferroelectric domain structure, leakage current, and multiferroic properties. Enhanced ferroelectric remanent polarization and reduced leakage current density were established via La substitution in the BiFeO_3 film. Based on leakage conduction mechanism and piezoelectric force microscopy studies, this is indicative of reduced trap densities and increased domain energy. Besides that, the ferromagnetic properties were improved by the La doping as well. The possible mechanisms for the enhancement of electrical and multiferroic characteristics are extensively discussed.
机译:我们报告了La置换对通过在Nb掺杂SrTiO_3衬底上进行脉冲层沉积而制备的外延BiFeO_3薄膜的影响,重点是铁电畴结构,漏电流和多铁性。通过在BiFeO_3膜中进行La取代,增强了铁电体的剩余极化并降低了漏电流密度。基于泄漏传导机制和压电力显微镜研究,这表明陷阱密度降低和畴能增加。除此之外,La掺杂也改善了铁磁性能。广泛讨论了增强电和多铁性特征的可能机制。

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  • 来源
    《Applied Physics Letters》 |2013年第13期|132907.1-132907.4|共4页
  • 作者

    Woo-Hee Kim; Jong Yeog Son;

  • 作者单位

    Process Development Team, System LSI Division, Samsung Electronics, San #24 Nongseo-Dong, Giheung-Gu, Yongin-City 446-711, Korea;

    Department of Applied Physics, College of Applied Science, Kyung Hee University, 1732 Deogyeong-daero, Giheung-Gu, Yongin-City 446-701, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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