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Near unity ideality factor and Shockley-Read-Hall lifetime in GaN-on-GaN p-n diodes with avalanche breakdown

机译:具有雪崩击穿的GaN-on-GaN p-n二极管的近似单位理想因子和Shockley-Read-Hall寿命

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摘要

Textbook-like device characteristics are demonstrated in vertical GaN p-n diodes grown on bulk GaN substrates. These devices show simultaneously an avalanche breakdown voltage (BV) of >1.4kV under reverse bias, an ideality factor plateau of ~2.0 in a forward bias window followed by a near unity ideality factor of 1.1, which are consistently achieved over a temperature range of 300-400 K. At room temperature (RT), the diode with a mesa diameter of 107 μm showed a differential on-resistance R_(on) of 0.12 mΩcm~2, thus resulting in a record figure-of-merit BV~2/R_(on) of ~16.5GW/cm~2, which is the highest ever demonstrated in any semiconductors. Analytical models are used to fit experimental I-Vs; based on the recombination current with an ideality factor of ~2.0, a Shockley-Read-Hall lifetime of 12 ns is extracted at RT with an estimated recombination center concentration of 3 × 10~(15) cm~(-3).
机译:在块状GaN衬底上生长的垂直GaN p-n二极管中展示了类似教科书的器件特性。这些器件同时显示出在反向偏置下的雪崩击穿电压(BV)> 1.4kV,在正向偏置窗口中的理想因子平台稳定在〜2.0,然后在1.1的温度范围内始终达到理想的理想因子。 300-400K。在室温(RT)时,台面直径为107μm的二极管显示的导通电阻R_(on)的差值为0.12mΩcm〜2,因此产生了创纪录的品质因数BV〜2 / R_(on)约为16.5GW / cm〜2,这是有史以来最高的半导体值。分析模型用于拟合实验IV。基于理想因子约为2.0的重组电流,在室温下提取的Shockley-Read-Hall寿命为12 ns,重组中心浓度估计为3×10〜(15)cm〜(-3)。

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  • 来源
    《Applied Physics Letters》 |2015年第24期|243501.1-243501.5|共5页
  • 作者单位

    School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA,Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA,Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA,Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA,Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    IQE RF LUC, Somerset, New Jersey 08873, USA;

    IQE RF LUC, Somerset, New Jersey 08873, USA;

    School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA,Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA,Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA,Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

    School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA,Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA,Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:24

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