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Thickness-dependent ferroelectric behavior of predominantly (117)-oriented Bi_(3.15)Nd_(0.85)Ti_3O_(12) thin-film capacitors

机译:主要为(117)取向的Bi_(3.15)Nd_(0.85)Ti_3O_(12)薄膜电容器的厚度依赖性铁电行为

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摘要

Ferroelectric hysteresis loops, remanent polarization, coercive field, and leakage current characteristics were investigated by increasing the film thickness (from 103 nm to 401 nm) of predominantly (117)-oriented Bi_(3.15)Nd_(0.85)Ti_3O_(12) films. The thickness dependence of the coercive fields shows log coercive field vs. log thickness with a slope of approximately -0.65, which is characteristics of the Kay-Dunn scaling law. The films exhibited very low leakage current on the order of 10~(-7)A/cm~2 at an applied electric field of 100kV/cm. Without a discernible thickness-dependence behavior, the leakage current characteristics, including both Schottky emission and space-charge-limited conduction, were well described by a modified Schottky contact model.
机译:通过增加主要是(117)取向的Bi_(3.15)Nd_(0.85)Ti_3O_(12)膜的膜厚度(从103 nm增加到401 nm),研究了铁电磁滞回线,剩余极化,矫顽场和漏电流特性。矫顽场的厚度依赖性显示对数矫顽场与对数厚度的斜率约为-0.65,这是Kay-Dunn比例定律的特征。在施加的100kV / cm电场下,薄膜的漏电流非常低,约为10〜(-7)A / cm〜2。如果没有明显的厚度依赖性行为,则漏电流特性(包括肖特基发射和空间电荷受限的导通)都可以通过改进的肖特基接触模型很好地描述。

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  • 来源
    《Applied Physics Letters》 |2015年第17期|172903.1-172903.5|共5页
  • 作者单位

    School of Materials Science and Engineering, University of Jinan, Jinan 250022, People's Republic of China,Key Laboratory of Inorganic Functional Materials in Universities of Shandong, School of Materials Science and Engineering, University of Jinan, Jinan 250022, China;

    School of Materials Science and Engineering, University of Jinan, Jinan 250022, People's Republic of China;

    School of Materials Science and Engineering, University of Jinan, Jinan 250022, People's Republic of China,Key Laboratory of Inorganic Functional Materials in Universities of Shandong, School of Materials Science and Engineering, University of Jinan, Jinan 250022, China;

    School of Materials Science and Engineering, University of Jinan, Jinan 250022, People's Republic of China;

    Hunan Provincial National Defense Key Laboratory of Key Film Materials and Application for Equipments, Xiangtan, 411105, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:05

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