机译:使用原子层沉积的钨增加填充床的导热性
Department of Chemical and Biological Engineering, University of Colorado, UCB 596, Boulder, Colorado 80309-0596, USA;
Lawrence Livermore National Laboratory, 7000 East Ave, Livermore, California 94550, USA;
Lawrence Livermore National Laboratory, 7000 East Ave, Livermore, California 94550, USA;
Department of Mechanical Engineering, University of Colorado, UCB 427, Boulder, Colorado 80309-0427, USA;
Department of Chemical and Biological Engineering, University of Colorado, UCB 596, Boulder, Colorado 80309-0596, USA;
Department of Chemical and Biological Engineering, University of Colorado, UCB 596, Boulder, Colorado 80309-0596, USA;
机译:原子层在硅上沉积的高k电介质氧化铝,氧化ha和氧化钛薄膜的热导率和热边界电阻
机译:NH_3热处理对沉积在钨膜上原子层和W-B-N形成的影响
机译:密度和尺寸对原子层沉积TiO_2和Al_2O_3薄膜热导率的影响
机译:等离子体增强原子层沉积钨膜的前体吸附机理,生长特性和电性能通过使用氧化钨前体沉积钨膜
机译:在空气 - 氧化铝填充床上的热能储存使用轴流,轴向流动,层和径向流动
机译:热电用Cu和Ni纳米颗粒填充床的导热系数和硬度的实验研究
机译:热电用Cu和Ni纳米颗粒填充床的导热系数和硬度的实验研究
机译:具有均匀球形颗粒的多孔填充床的有效导热系数