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Probing the density of states of two-level tunneling systems in silicon oxide films using superconducting lumped element resonators

机译:使用超导集总元件谐振器探测氧化硅膜中两能级隧穿系统的状态密度

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摘要

We have investigated dielectric losses in amorphous silicon oxide (a-SiO) thin films under operating conditions of superconducting qubits (mK temperatures and low microwave powers). For this purpose, we have developed a broadband measurement setup employing multiplexed lumped element resonators using a broadband power combiner and a low-noise amplifier. The measured temperature and power dependences of the dielectric losses are in good agreement with those predicted for atomic two-level tunneling systems (TLS). By measuring the losses at different frequencies, we found that the TLS density of states is energy dependent. This had not been seen previously in loss measurements. These results contribute to a better understanding of decoherence effects in superconducting qubits and suggest a possibility to minimize TLS-related decoherence by reducing the qubit operation frequency.
机译:我们已经研究了超导量子位(mK温度和低微波功率)的工作条件下非晶氧化硅(a-SiO)薄膜的介电损耗。为此,我们开发了一种宽带测量装置,该装置使用了宽带集束器和低噪声放大器的多路集总元件谐振器。测得的介电损耗的温度和功率相关性与针对原子二级隧道系统(TLS)预测的相关性很好。通过测量不同频率下的损耗,我们发现状态的TLS密度与能量有关。以前从未在损耗测量中看到这一点。这些结果有助于更好地理解超导量子位中的相干效应,并提出通过降低量子位操作频率来最大程度降低与TLS相关的相干性的可能性。

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  • 来源
    《Applied Physics Letters》 |2015年第2期|022603.1-022603.4|共4页
  • 作者单位

    Physikalisches Institut, Karlsruher Institut fuer Technologic Wolfgang-Gaede-Strasse 1,D-76131 Karlsruhe, Germany,Institut fuer Mikro- und Nanoelektronische Systeme, Karlsruher Institut fuer Technologie, Hertzstrasse 16, D-76187 Karlsruhe, Germany;

    Institut fuer Mikro- und Nanoelektronische Systeme, Karlsruher Institut fuer Technologie, Hertzstrasse 16, D-76187 Karlsruhe, Germany;

    Institut fuer Mikro- und Nanoelektronische Systeme, Karlsruher Institut fuer Technologie, Hertzstrasse 16, D-76187 Karlsruhe, Germany;

    Physikalisches Institut, Karlsruher Institut fuer Technologic Wolfgang-Gaede-Strasse 1,D-76131 Karlsruhe, Germany;

    Physikalisches Institut, Karlsruher Institut fuer Technologic Wolfgang-Gaede-Strasse 1,D-76131 Karlsruhe, Germany;

    Physikalisches Institut, Karlsruher Institut fuer Technologic Wolfgang-Gaede-Strasse 1,D-76131 Karlsruhe, Germany;

    Physikalisches Institut, Karlsruher Institut fuer Technologic Wolfgang-Gaede-Strasse 1,D-76131 Karlsruhe, Germany;

    Institut fuer Mikro- und Nanoelektronische Systeme, Karlsruher Institut fuer Technologie, Hertzstrasse 16, D-76187 Karlsruhe, Germany;

    Physikalisches Institut, Karlsruher Institut fuer Technologic Wolfgang-Gaede-Strasse 1,D-76131 Karlsruhe, Germany,Russian Quantum Center, 100 Novaya St., Skolkovo, Moscow Region 143025, Russia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:03

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