首页> 外文期刊>Applied Physics Letters >Theory of multiple quantum dot formation in strained-layer heteroepitaxy
【24h】

Theory of multiple quantum dot formation in strained-layer heteroepitaxy

机译:应变层异质外延中多量子点形成的理论

获取原文
获取原文并翻译 | 示例
       

摘要

We develop a theory for the experimentally observed formation of multiple quantum dots (QDs) in strained-layer heteroepitaxy based on surface morphological stability analysis of a coherently strained epitaxial thin film on a crystalline substrate. Using a fully nonlinear model of surface morphological evolution that accounts for a wetting potential contribution to the epitaxial film's free energy as well as surface diffusional anisotropy, we demonstrate the formation of multiple QD patterns in self-consistent dynamical simulations of the evolution of the epitaxial film surface perturbed from its planar state. The simulation predictions are supported by weakly nonlinear analysis of the epitaxial film surface morphological stability. We find that, in addition to the Stranski-Krastanow instability, long-wavelength perturbations from the planar film surface morphology can trigger a nonlinear instability, resulting in the splitting of a single QD into multiple QDs of smaller sizes, and predict the critical wavelength of the film surface perturbation for the onset of the nonlinear tip-splitting instability. The theory provides a fundamental interpretation for the observations of "QD pairs" or "double QDs" and other multiple QDs reported in experimental studies of epitaxial growth of semiconductor strained layers and sets the stage for precise engineering of tunable-size nanoscale surface features in strained-layer heteroepitaxy by exploiting film surface nonlinear, pattern forming phenomena.
机译:我们基于在晶体衬底上相干应变的外延薄膜的表面形态稳定性分析,为在应变层异质外延中实验观察到的多个量子点(QD)的形成发展了一种理论。使用完全非线性的表面形态演化模型来解释外延膜的自由能以及表面扩散各向异性的润湿潜能,我们在自洽的外延膜演化动力学模拟中证明了多个QD图案的形成表面从其平面状态受到干扰。通过外延膜表面形态稳定性的弱非线性分析来支持模拟预测。我们发现,除了Stranski-Krastanow不稳定性之外,平面膜表面形态的长波扰动还可能引发非线性不稳定性,从而导致单个QD分裂为多个较小尺寸的QD,并预测了临界波长。膜表面扰动是非线性尖端分裂不稳定性的开始。该理论为在半导体应变层的外延生长实验研究中报告的“ QD对”或“双QD”以及其他多个QD的观察提供了基本解释,并为应变中可调节尺寸的纳米级表面特征的精确工程化奠定了基础通过利用膜表面的非线性,图案形成现象来实现层异质外延。

著录项

  • 来源
    《Applied Physics Letters》 |2016年第2期|023103.1-023103.4|共4页
  • 作者

    Lin Du; Dimitrios Maroudas;

  • 作者单位

    Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-9303, USA;

    Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-9303, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:14:44

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号