Characterization of chemical doping of graphene by in-situ Raman spectroscopy

摘要

We explored single-layer graphene and graphene field-effect transistors immersed in nitric acid using in-situ Raman spectroscopy. Two distinct stages were observed in the chemical doping process. The first stage involved blue shifts of the G and 2D peaks, whose saturation occurred rapidly with a time constant in the range of 10-25 s depending on the molar concentration of the acid. In the second stage, the intensity of the D peak, which was associated with structural defect formation, increased for a relatively long period of time. Since the major doping effects appeared during the first stage, the optimal doping conditions under which no noticeable structural defect formation occurred can be determined by monitoring the frequency shift. Transient doping concentrations along with structural defect densities were obtained from the Raman peak positions and intensities. We found that the doping-induced shift in the Dirac point in graphene field-effect transistors exhibited a fast response with respect to frequency shifts in the Raman spectra, which was attributed to the saturation of electrostatic gating effects.