机译:NbO_x中S型负差分电阻的精确局部有源忆阻器模型
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
PTD-PPS, Hewlett-Packard Company, 1070 NE Circle Boulevard, Corvallis, Oregon 97330, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, USA;
机译:具有局部活性S型NbO x sub>忆阻器的图形形成
机译:关于GaP LED中S型负差分电阻的键合模型
机译:NbO_x中电流局部化和重新分布为不连续电流控制的负差分电阻的基础
机译:新一类S型电流控制非线性负电阻
机译:晶体管电路中的负微分电阻(非线性,器件,化合物,SCR建模,电阻多端口)。
机译:负差分电阻:基于铪二硫键/五苯杂交结构的双负差分电阻装置(ADV。SCI。19/2020)
机译:S型NBO X局部活动忆故忆的简单建模