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Scandium doped Ge_2Sb_2Te_5 for high-speed and low-power-consumption phase change memory

机译:dium掺杂的Ge_2Sb_2Te_5,用于高速和低功耗相变存储器

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摘要

To bridge the gap of access time between memories and storage systems, the concept of storage class memory has been put forward based on emerging nonvolatile memory technologies. For all the nonvolatile memory candidates, the unpleasant tradeoff between operation speed and retention seems to be inevitable. To promote both the write speed and the retention of phase change memory (PCM), Sc doped Ge2Sb2Te5 (SGST) has been proposed as the storage medium. Octahedral Sc-Te motifs, acting as crystallization precursors to shorten the nucleation incubation period, are the possible reason for the high write speed of 6 ns in PCM cells, five-times faster than that of Ge2Sb2Te5 (GST) cells. Meanwhile, an enhanced 10-year data retention of 119 degrees C has been achieved. Benefiting from both the increased crystalline resistance and the inhibited formation of the hexagonal phase, the SGST cell has a 77% reduction in power consumption compared to the GST cell. Adhesion of the SGST/SiO2 interface has been strengthened, attributed to the reduced stress by forming smaller grains during crystallization, guaranteeing the reliability of the device. These improvements have made the SGST material a promising candidate for PCM application. Published by AIP Publishing.
机译:为了弥合存储器和存储系统之间的访问时间差距,基于新兴的非易失性存储技术提出了存储类存储器的概念。对于所有的非易失性存储器候选者,在操作速度和保留之间的不愉快折衷似乎是不可避免的。为了提高写入速度和相变存储器(PCM)的保留,已提出了掺Sc的Ge2Sb2Te5(SGST)作为存储介质。八面体Sc-Te图案作为结晶前体以缩短成核潜伏期,是PCM单元中6 ns高写入速度的可能原因,比Ge2Sb2Te5(GST)细胞快五倍。同时,已实现119摄氏度的10年数据保留增强。受益于增加的结晶电阻和受抑制的六方相形成,与GST电池相比,SGST电池的功耗降低了77%。 SGST / SiO2界面的粘合性得到了增强,这归因于在结晶过程中形成了较小的晶粒,从而降低了应力,从而保证了器件的可靠性。这些改进使SGST材料成为PCM应用的有希望的候选者。由AIP Publishing发布。

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  • 来源
    《Applied Physics Letters》 |2018年第13期|133104.1-133104.5|共5页
  • 作者单位

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:13:50

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