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Fin-channel orientation dependence of forward conduction in kV-class Ga_2O_3 trench Schottky barrier diodes

机译:翅片沟道取向依赖性依赖于kV级Ga_2O_3沟槽肖特基屏障二极管

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Ga2O3 vertical trench Schottky barrier diodes with four different fin-channel orientations are realized on (001) substrates and compared. Fin-channels along the [010] direction with (100)-like sidewalls result in the highest forward current, while other channel orientations all lead to a shallow turn-on behavior and much lower forward current, indicative of severe sidewall depletion attributed to negative interface charges. The comparison indicates that the interface charge density is the smallest on the (100)-like surfaces. The breakdown voltage of the diodes with 1-mu m fin width is around 2.4 kV, with no apparent dependence on the channel orientation. (C) 2019 The Japan Society of Applied Physics
机译:Ga2O3垂直沟槽肖特基屏障二极管,具有四种不同的鳍频道取向,在(001)基板上实现并比较。沿[010]方向的翅片通道与(100) - 状侧壁导致最高正向电流,而其他信道方向均导致浅开启行为和低得多的前进电流,指示归因于负的严重侧壁耗尽接口费用。比较表明界面电荷密度是(100)状表面上最小的。二极管的击穿电压为1-mu m纤维宽度约为2.4kV,对沟道方向没有明显的依赖性。 (c)2019年日本应用物理学会

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    《Annales de l'I.H.P》 |2019年第6期|061007.1-061007.4|共4页
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    Cornell Univ Sch Elect & Comp Engn Ithaca NY 14853 USA;

    Cornell Univ Sch Elect & Comp Engn Ithaca NY 14853 USA;

    Cornell Univ Sch Elect & Comp Engn Ithaca NY 14853 USA;

    Cornell Univ Sch Elect & Comp Engn Ithaca NY 14853 USA|Cornell Univ Dept Mat Sci & Engn Ithaca NY 14853 USA|Cornell Univ Kavli Inst Nanoscale Sci Ithaca NY 14853 USA;

    Cornell Univ Sch Elect & Comp Engn Ithaca NY 14853 USA|Cornell Univ Dept Mat Sci & Engn Ithaca NY 14853 USA|Cornell Univ Kavli Inst Nanoscale Sci Ithaca NY 14853 USA;

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