机译:L_G = 25 nm Ingaas / Inalas高电子移动晶体管,具有f_t和f_(max)超过700 ghz
Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;
Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;
Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;
Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;
Univ Ulsan Sch Elect Engn Ulsan South Korea;
Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;
NTT Device Technol Labs Atsugi Kanagawa Japan;
NTT Device Technol Labs Atsugi Kanagawa Japan;
NTT Device Technol Labs Atsugi Kanagawa Japan;
机译:L_g = 25 nm InGaAs / InAlAs高电子迁移率晶体管,其中f_T和f_(max)都超过700 GHz
机译:f_(max)超过408 GHz的GaAs衬底上的增强模式L_g = 50 nm变质InAlAs / InGaAs HEMT
机译:
机译:具有F_T = 41 GHz和F_(MAX)= 44 GHz的钻石RF晶体管技术
机译:在装置性能上indaas / Inalas高电子迁移率晶体管的活性通道中过量铟的结果
机译:InGaas / Inalas高电子迁移率晶体管有源沟道中过量铟的后果对器件特性的影响