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L_g = 25 nm InGaAs/InAlAs high-electron mobility transistors with both f_T and f_(max) in excess of 700 GHz

机译:L_G = 25 nm Ingaas / Inalas高电子移动晶体管,具有f_t和f_(max)超过700 ghz

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In this paper, we report an L-g = 25 nm InGaAs/InAlAs HEMT on InP substrate that delivers excellent high-frequency characteristics. The device exhibited a value of maximum transconductance (g(m_max)) = 2.8 mS mu m(-1) at V-DS = 0.8 V and on-resistance (R-ON) = 279 Omega mu m. At I-D = 0.56 mA mu m(-1) and V-DS = 0.5 V, the same device displayed an excellent combination of f(T) = 703 GHz and f(max) = 820 GHz. To the best of the authors' knowledge, this is the first demonstration of a transistor with both f(T) and f(max) over 700 GHz on any material system. (C) 2019 The Japan Society of Applied Physics
机译:在本文中,我们在INP衬底上报道了L-G = 25 nm Ingaas / Inalas HEMT,可提供出色的高频特性。该器件表现出最大跨导(G(M_max))= 2.8ms mu m(-1)的值= 0.8V和导通电阻(R-ON)= 279ωμm。在I-D = 0.56 mu m m(-1)和V-ds = 0.5V时,相同的设备显示出F(T)= 703 GHz和F(MAX)= 820GHz的优异组合。据作者所知,这是任何材料系统上的F(T)和F(最多)超过700GHz的晶体管的第一次演示。 (c)2019年日本应用物理学会

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  • 来源
    《Annales de l'I.H.P》 |2019年第5期|054006.1-054006.4|共4页
  • 作者单位

    Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;

    Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;

    Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;

    Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;

    Univ Ulsan Sch Elect Engn Ulsan South Korea;

    Kyungpook Natl Univ Sch Elect Engn Daegu South Korea;

    NTT Device Technol Labs Atsugi Kanagawa Japan;

    NTT Device Technol Labs Atsugi Kanagawa Japan;

    NTT Device Technol Labs Atsugi Kanagawa Japan;

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