In-situ Observation of the Three-Dimensional Nano-Structure Growth on Focused-lon-Beam Chemical Vapor Deposition by Scanning Electron Microscope

摘要

To fabricate arbitrary three-dimensional (3-D) nanostructures, it is necessary to first understand the growth mechanism that occurs during focused-ion-beam chemical vapor deposition (FIB-CVD). With the aim of elucidating these details, we carried out in-situ observation of 3-D nanostructure growth during FIB-CVD using a scanning electron microscope (SEM) in a FIB/SEM dual-beam system. As a result, we demonstrated experimentally that the 3-D nanostructure growth depended on the beam profile of the FIB as well as the FIB irradiation time and scanning speed.