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首页> 外文期刊>Annales de l'I.H.P >Enhanced Light Output of AIGalnP Light Emitting Diodes Using an Indium-Zinc Oxide Transparent Conduction Layer and Electroplated Metal Substrate
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Enhanced Light Output of AIGalnP Light Emitting Diodes Using an Indium-Zinc Oxide Transparent Conduction Layer and Electroplated Metal Substrate

机译:使用铟锌氧化物透明导电层和电镀金属基板增强AIGalnP发光二极管的光输出

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摘要

The use of indium-zinc oxide (IZO) as a transparent conduction layer (TCL) for electroplated nickel metal substrate AIGalnP light-emitting diodes with a 300 x 300 μm~2 chip size was investigated with regard to both fabrication and effectiveness in improving light extraction efficiency. A metal system consisting of AuGe/Au was deposited to form ohmic contact dots for the n~+-GaAs layer, and then an IZO film was deposited to serve as a TCL. Compared with conventional light emitting diodes (LEDs) with GaAs substrates, the proposed LEDs show an increase in light output power (i.e., △L_(op)/L_(op)) by 116.7% at 20 mA and 168.9% at 100 mA.
机译:研究了使用铟锌氧化物(IZO)作为芯片尺寸为300 x 300μm〜2的电镀镍金属衬底AIGalnP发光二极管的透明导电层(TCL)的方法,同时兼顾了制造和改善光的有效性提取效率。沉积由AuGe / Au组成的金属系统以形成用于n〜+ GaAs层的欧姆接触点,然后沉积IZO膜以用作TCL。与具有GaAs基板的常规发光二极管(LED)相比,拟议的LED在20 mA时的光输出功率(即△L_(op)/ L_(op))增加了116.7%,在100 mA时增加了168.9%。

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  • 来源
    《Annales de l'I.H.P》 |2011年第1期|p.012101.1-012101.3|共3页
  • 作者单位

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan 70101, R.O.C.;

    Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan, Taiwan 70101, R.O.C.;

    Department of Electrical Engineering, WuFeng University, Chia-yi Country, Taiwan 621, R.O.C.;

    Department of Electrical Engineering, WuFeng University, Chia-yi Country, Taiwan 621, R.O.C.;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan 70101, R.O.C.;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan 70101, R.O.C.;

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