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机译:CVD生长重掺杂Al的4H-SiC厚外延层的跳跃传导范围
Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;
Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;
Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;
Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;
Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;
Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;
Central Research Institute of Electric Power Industry, Yokosuka, Kanagawa 240-0196, Japan;
Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;
机译:在重掺杂Al的4H-SiC外延层中,由于Al的掺杂,传导机制从能带跃迁到变程跳跃传导
机译:通过热壁化学气相沉积法生长的低电阻率,厚重Al掺杂的厚4H-SiC外延层
机译:霍尔跳闸传导中霍尔系数的迹象的简单物理模型,在掺杂的p型4h-sic中
机译:低电阻率,厚重的抗体4H-SiC脱落剂通过热壁化学气相沉积生长
机译:在4H-碳化硅PVT生长的块状晶体,CVD生长的外延层和器件中的缺陷研究。
机译:碳化聚合物纳米纤维中变程跳跃传导的视在功率定律缩放。
机译:紫外光致发光成像光谱技术在厚,轻度n型掺杂,4°-off 4H-SiC外延层上的堆垛层错识别中的应用