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Hopping conduction range of heavily Al-doped 4H-SiC thick epilayers grown by CVD

机译:CVD生长重掺杂Al的4H-SiC厚外延层的跳跃传导范围

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摘要

To outline the hopping conduction range, the electrical characteristics of CVD-grown heavily Al-doped 4H-SiC thick epilayers (2.0 × 10~(19)-4.0 × 10~(20)cm~(-3)) were investigated in a wide temperature regime (20-900 K). It is found that, below 100K, hopping conduction dominates the carrier transport for all epilayers, and the corresponding hopping conduction activation energy shows a maximum of ~30 meV at around 1.1 × 10~(20) cm~(-3). With increasing doping level, the temperature dependence of resistivity evolves and finally obeys the ~1 /T~(1/4) law in the entire temperature regime, which gives direct evidence of variable-range hopping conduction.
机译:为了概述跳跃传导范围,研究了CVD生长的重掺杂Al的4H-SiC厚外延层(2.0×10〜(19)-4.0×10〜(20)cm〜(-3))的电学特性。宽温度范围(20-900 K)。结果表明,在100K以下,跳跃传导主导了所有外延层的载流子传输,相应的跳跃传导活化能在1.1×10〜(20)cm〜(-3)处显示最大〜30 meV。随着掺杂水平的提高,电阻率对温度的依赖性逐渐​​增强,并最终在整个温度范围内遵循〜1 / T〜(1/4)定律,这直接给出了变程跳跃传导的证据。

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  • 来源
    《Applied physics express》 |2015年第12期|121302.1-121302.4|共4页
  • 作者单位

    Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;

    Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;

    Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;

    Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;

    Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;

    Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;

    Central Research Institute of Electric Power Industry, Yokosuka, Kanagawa 240-0196, Japan;

    Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan;

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