Photoresist Templates for Wafer-Scale Defect-Free Evaporative Lithography

摘要

Template guided evaporative self-assembly of nanoparticulates that are initially dispersed in suspension could provide a flexible and energy efficient method for large scale patterning, including that of ordered microwire networks. A possible application for such networks is to create transparent-conducting coatings of metallic microwires that could be used as an alternative to the industry standard indium tin oxide (ITO) . In this communication we introduce an evaporative lithography method that extends previous approaches by using a photolithography defined photoresist as the template, thus enabling the production of wafer-scale, defect-free functional microwire networks in a variety of well controlled topologies (Figure 1).