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Low-Temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition

机译:等离子体增强化学气相沉积法直接在塑料基底上低温合成大型二硫化钼薄膜

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  • 来源
    《Advanced Materials》 |2015年第35期|5223-5229|共7页
  • 作者单位

    Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, Gyeonggi Do, South Korea;

    Sungkyunkwan Univ, Sch Mech Engn, Suwon 440746, Gyeonggi Do, South Korea;

    Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, Gyeonggi Do, South Korea;

    Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, Gyeonggi Do, South Korea;

    Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, Gyeonggi Do, South Korea;

    Ulsan Natl Inst Sci & Technol UNIST, Sch Mat Sci & Engn, Ulsan 689798, South Korea;

    Ulsan Natl Inst Sci & Technol UNIST, Sch Mat Sci & Engn, Ulsan 689798, South Korea;

    Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, Gyeonggi Do, South Korea|Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, Gyeonggi Do, South Korea;

    Samsung Elect, Semicond R&D Ctr, Hwaseong 445701, Gyeonggi Do, South Korea;

    Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, Gyeonggi Do, South Korea;

    Sungkyunkwan Univ, Sch Mech Engn, Suwon 440746, Gyeonggi Do, South Korea;

    Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, Gyeonggi Do, South Korea|Sungkyunkwan Univ, Sch Mech Engn, Suwon 440746, Gyeonggi Do, South Korea;

    Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, Gyeonggi Do, South Korea|Sungkyunkwan Univ, Sch Mech Engn, Suwon 440746, Gyeonggi Do, South Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    flexible sensor; low temperature; molybdenum disulfide (MoS2); plasma-enhanced chemical vapor deposition (PECVD); plastic substrate;

    机译:柔性传感器;低温;二硫化钼(MoS2);等离子体增强化学气相沉积(PECVD);塑料基板;

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