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Precursor Decomposition, Microstructure, and Porosity of Yttria Stabilized Zirconia Thin Films Prepared by Aerosol-Assisted Chemical Vapor Deposition

机译:气溶胶辅助化学气相沉积法制备的氧化钇稳定氧化锆薄膜的前体分解,微观结构和孔隙率

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摘要

Microstructures of yttria stabilized zirconia thin films deposited by aerosol assisted chemical vapor deposition (AA-CVD) are correlated with the thermal decomposition behavior of the corresponding metal precursors, zirconium and yttrium 2,4-pentanedionate. Process conditions of AA-CVD are investigated with the aim of producing dense and compact YSZ thin films for applications as gas-tight electrolyte. Based on systematic cross sectional scanning transmission electron microscopy (STEM) investigations and conductivity measurements, the development of percolating nanoporosity is observed in samples prepared at temperatures between 350 ℃ and 600 ℃ at standard solution throughput. Compact columnar thin films with bulk conductivity are obtained at 600 ℃ by reducing the metal content of the precursor solution and at 450 ℃ by reducing the solution throughput.
机译:通过气溶胶辅助化学气相沉积(AA-CVD)沉积的氧化钇稳定的氧化锆薄膜的微观结构与相应的金属前体锆和2,4-戊二酸钇的热分解行为相关。研究了AA-CVD的工艺条件,目的是生产致密致密的YSZ薄膜,用作气密性电解质。基于系统的截面扫描透射电子显微镜(STEM)研究和电导率测量,在标准溶液通量下,在350℃至600℃的温度下制备的样品中观察到了渗流纳米孔隙的发展。通过降低前驱体溶液中的金属含量,在600℃时获得块状电导率的致密柱状薄膜,在450℃通过降低溶液的通量获得致密的柱状薄膜。

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  • 来源
    《Advanced energy materials》 |2013年第3期|375-385|共11页
  • 作者单位

    Nonmetallic Inorganic Materials ETH Zuerich, Wolfgang-Pauli-Str. 10 8093 Zurich, Switzerland;

    Nonmetallic Inorganic Materials ETH Zuerich, Wolfgang-Pauli-Str. 10 8093 Zurich, Switzerland;

    Nonmetallic Inorganic Materials ETH Zuerich, Wolfgang-Pauli-Str. 10 8093 Zurich, Switzerland;

    Nonmetallic Inorganic Materials ETH Zuerich, Wolfgang-Pauli-Str. 10 8093 Zurich, Switzerland,International Institute for Carbon Neutral Energy Research (WPI-I2CNER) Kyushu University 744 Moto-oka, Nishi-ku, Fukuoka 819-0395, Japan;

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