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Maximum field emission current density of CuO nanowires: theoretical study using a defect-related semiconductor field emission model and in situ measurements

机译:CuO纳米线的最大场发射电流密度:使用与缺陷相关的半导体场发射模型和原位测量的理论研究

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摘要

In this study, we proposed a theoretical model for one-dimensional semiconductor nanowires (NWs), taking account of the defect-related electrical transport process. The maximum emission current density was calculated by considering the influence of Joule heating, using a one-dimensional heat equation. The field emission properties of individual CuO NWs with different electrical properties were studied using an in situ experimental technique. The experimental results for maximum emission current density agreed well with the theoretical predictions and suggested that multiple conduction mechanisms were active. These may be induced by the concentration of defects in the CuO NW. The concentration of defects and the transport mechanisms were found to be key factors influencing the maximum field emission current density of the semiconductor NW. As is limited by the change of resistivity with temperature, only thermal runaway can trigger breakdown in CuO NWs.
机译:在这项研究中,我们提出了一种一维半导体纳米线(NWs)的理论模型,其中考虑了与缺陷有关的电传输过程。使用一维热方程,通过考虑焦耳加热的影响来计算最大发射电流密度。使用原位实验技术研究了具有不同电特性的单个CuO NW的场发射特性。最大发射电流密度的实验结果与理论预测吻合良好,表明多种传导机制是活跃的。这些可能是由于CuO NW中缺陷的集中所致。发现缺陷的浓度和传输机制是影响半导体NW的最大场发射电流密度的关键因素。受电阻率随温度变化的限制,只有热失控会触发CuO NWs击穿。

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