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Effect of Soft X-ray Irradiation on Film Properties of a Hydrogenated Si-Containing DLC Film

机译:软X射线照射对含氢Si的DLC膜膜性能的影响

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摘要

The effect of soft X-ray irradiation on hydrogenated silicon-containing diamond-like carbon (Si-DLC) films intended for outer space applications was investigated by using synchrotron radiation (SR). We found that the reduction in film thickness was about 60 nm after 1600 mA·h SR exposure, whereas there was little change in their elemental composition. The reduction in volume was attributable to photoetching caused by SR, unlike the desorption of hydrogen in the case of exposure of hydrogenated DLC (H-DLC) film to soft X-rays. The ratio of the sp2 hybridization carbon and sp3 hybridization carbon in the hydrogenated Si-DLC films, sp2/(sp2 + sp3) ratio, increased rapidly from ~0.2 to ~0.5 for SR doses of less than 20 mA·h. SR exposure significantly changed the local structure of carbon atoms near the surface of the hydrogenated Si-DLC film. The rate of volume reduction in the irradiated hydrogenated Si-DLC film was 80 times less than that of the H-DLC film. Doping DLC film with Si thus suppresses the volume reduction caused by exposure to soft X-rays.
机译:通过使用同步辐射(SR)研究了软X射线照射对用于外层空间应用的含氢的含硅的金刚石样碳(Si-DLC)膜。我们发现,在1600 mA·H SR暴露后,膜厚度的降低约为60nm,而它们的元素组合物几乎没有变化。在氢化DLC(H-DLC)膜暴露于软X射线的情况下,体积的减小是可归因于由SR引起的光拍摄。 SP2杂交碳和SP3杂交碳在氢化的Si-DLC膜中,SP2 /(SP2 + SP3)比的比例从小于20mA·h的SR剂量从〜0.2至0.5的速度迅速增加。 Sr曝光显着改变了氢化Si-DLC膜表面附近的碳原子的局部结构。辐照氢化的Si-DLC膜的体积减少速率比H-DLC膜的体积减少80倍。用Si掺杂DLC膜,因此抑制了暴露于软X射线引起的体积减少。

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