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Under-Etched Plasmonic Disks on Indium Tin Oxide for Enhanced Refractive Index Sensing on a Combined Electrochemical and Optical Platform

机译:氧化铟锡上蚀刻不足的等离子磁盘用于电化学和光学平台相结合的增强折射率传感

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摘要

A simple approach to enhance the refractive index sensitivity of gold nanodisks immobilized on electrically conducting indium tin oxide (ITO) substrates has been demonstrated. A two-fold increase in sensitivity to bulk refractive index change was achieved by substrate under-etching of gold nanodisks on ITO in 50 mM sulfuric acid. The influence of an intermediate titanium adhesion layer was investigated and was found to markedly influence the etching pattern and time. Etching with an adhesion layer resulted in enhanced refractive index sensitivity on disk-on-pin like structures after long etching times, whereas etching of disks deposited directly on ITO resulted in a disk-on-pincushion like configuration and similarly enhanced sensitivity already at shorter times. The gold disks remained electrically connected to the ITO substrate throughout etching and allowed site-specific electrodeposition of poly(3-aminophenol) at the nanodisks, showing enhanced thin-film refractive index sensitivity. This work demonstrates a simple method for enhancing refractive index sensitivity of nanostructures on ITO substrates for combined electrochemical and optical platforms, and subsequently a method to modify the surface of the electrically connected nanostructures, which has potential application in biosensing.
机译:已经证明了一种简单的方法来增强固定在导电铟锡氧化物(ITO)衬底上的金纳米盘的折射率灵敏度。通过在50 mM硫酸中对ITO上的金纳米盘进行底蚀,可以实现对整体折射率变化的敏感性提高两倍。研究了中间钛粘附层的影响,发现其显着影响蚀刻图案和时间。在较长的蚀刻时间后,用粘合层进行蚀刻会提高针状磁盘结构上的折射率灵敏度,而直接沉积在ITO上的磁盘的蚀刻会导致类似枕形磁盘的配置,并且类似的灵敏度也已在较短的时间内提高。金盘在整个蚀刻过程中保持与ITO基板的电连接,并允许在纳米盘上对聚(3-氨基苯酚)进行特定位置的电沉积,从而提高了薄膜的折射率敏感性。这项工作演示了一种简单的方法,可以提高用于组合电化学和光学平台的ITO基板上纳米结构的折射率敏感性,随后证明了一种修饰电连接纳米结构表面的方法,该方法在生物传感中具有潜在的应用。

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